Product Detail

Equipped with polycapillary X-ray focusing optics and a silicon drift detector, FT160 enables high preciseness and high throughput in nano-order level coating thickness measurement of electronic parts. Polycapillary X-ray focusing optics Accomplishing highly precise measurement by irradiate high-luminance primary x-ray to the area of about 30 μmφ. Silicon Drift Detector (SDD) as a detection system High count rate silicon drift detector enables highly precise measurement. Automatic measurement assistant function Precise multi-point automatic measurement function helps high efficiencies of the measurement. Easy operation enabled with simple interface and help function of the software Daily routine measurements can be conducted easily by using registered application-like recipe. Safety-conscious instrument design Adoption of closed housing greatly minimizes the risk of x-ray leakage. Wide door design improves visibility of the sample and operability of the instrument. Specifications: Model FT160S FT160Sh FT160 FT160h FT160L FT160Lh X-ray source Standard High-energy Standard High-energy Standard High-energy Mo W Mo W Mo W Elements Atomic No. 13(Al) to 92(U) Sample stage (mm) 300(W) × 245(D) 420(W) × 320(D) 620(W) × 620(D) Maximum sample size (mm) 300(X) × 245(Y) × 80(Z) 400(X) × 300(Y) × 100(Z) 600(X) × 600(Y) × 20(Z)